The close collaboration with our customers to realize efficient technologies of plasma chemical surface treatment is a principle
of the company conception.
We estimate our activity by the success and the satisfaction of
Based upon our long experience in solid state, plasma and high-frequency technologies we see ourselves as a provider of customized efficient key components of Plasma Chemical Vapor Deposition (PECVD) and Plasmapolymerization for a great variety of applications in the high-technology sector. Main purposes of our activity are technological and technical sophisticated solutions as well as quick, professional assistance by
• Technology acceptance test in our facilities
• Cooperation with leading equipment suppliers for the vacuum thin
film technology and related components as for example high
frequency power supplies
• Collaboration with research centers and universities with the latest
measuring and analysis equipment.
Our efficient services for peripheral reactor assemblies
• RF power supplies and matching networks and
• Mass flow controller (MFC)
decisive for process quality and productivity, contribute to a considerable economic success for our business partners.
We support our customers with a 24 hr service seven days a week.
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FAP GmbH Dresden
Gostritzer Str. 67 B
Tel.: + 49 351 8718110
Fax: + 49 351 8718416